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µPlasma printing of hydrophobic and hydrophilic patterns to improve wetting behaviour for printed electronics

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µPlasma printing of hydrophobic and hydrophilic patterns to improve wetting behaviour for printed electronics

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Samenvatting

Inkjet printing is a rapidly growing technology for depositing
functional materials in the production of organic electronics.
Challenges lie among others in the printing of high resolution
patterns with high aspect ratio of functional materials to obtain the
needed functionality like e.g. conductivity. μPlasma printing is a
technology which combines atmospheric plasma treatment with the
versatility of digital on demand printing technology to selectively
change the wetting behaviour of materials. In earlier research it
was shown that with μPlasma printing it is possible to selectively
improve the wetting behaviour of functional inks on polymer
substrates using atmospheric air plasma. In this investigation we
show it is possible to selectively change the substrate wetting
behaviour using combinations of different plasmas and patterned
printing. For air and nitrogen plasmas, increased wetting of printed
materials could be achieved on both polycarbonate and glass
substrates. A minimal track width of 320 μm for a 200 μm wide
plasma needle was achieved. A combination of N2 with HMDSO
plasma increases the contact angle for water up from <100 to 1050
and from 320 to 460 for DEGDMA making the substrate more
hydrophobic. Furthermore using N2-plasma in combination with a
N2/HMDSO plasma, hydrophobic tracks could be printed with
similar minimal track width. Combining both N2 -plasma and
N2/HMDSO plasma treatments show promising results to further
decrease the track width to even smaller values

Toon meer
OrganisatieFontys Hogescholen
InstituutFontys Hogeschool Toegepaste Natuurwetenschappen
LectoraatLectoraat Thin films and functional materials
Gepubliceerd inLOPEC proceedings 2012
Jaar2012
TypeConferentiebijdrage
TaalEngels

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